Proportional flow control valves, specifically the SE and SEH types, are crucial hydraulic machine accessories that ensure consistent flow rates across various hydraulic applications. These valves are designed to maintain a steady flow regardless of fluctuations in load, which is essential for achieving precision in hydraulic systems. Their ability to be managed remotely through electroproportional means adds to their versatility, making them suitable for modern automated applications. The SE type of proportional flow control valve features a directly operated metering orifice. This design enhances controllability, allowing for very low flow rates—approaching zero flow (Qmin). This characteristic is particularly beneficial in applications where fine adjustments are necessary, enabling operators to achieve the desired performance with minimal waste and increased efficiency. In contrast, the SEH variant incorporates a piloted metering orifice. This design is specifically advantageous in dynamic systems that require rapid response times. The piloted mechanism allows for quicker adjustments to flow rates, making it ideal for applications where responsiveness is critical, such as in mobile equipment or systems that experience frequent changes in demand.

Both SE and SEH variants can be obtained as standalone valves, allowing for direct pipe connections, or as manifold-mounted options. This flexibility in installation means that they can be easily integrated into existing hydraulic systems, enhancing their functionality without extensive modifications. The manifold-mounted versions are particularly useful in compact spaces, allowing for efficient use of hydraulic machine accessories while maintaining system integrity. In summary, proportional flow control valves like the SE and SEH types are indispensable hydraulic machine accessories that provide precise control over fluid flow in hydraulic systems. Their remote management capabilities, combined with the unique features of each variant, ensure that operators can achieve optimal performance and efficiency across a wide range of applications.